使用FIB光刻的3D微流体通道的应用图

电子束光刻、FIB加工、纳米工程和逆向工程正在为前沿研究和工业提供解决方案。

ionLINE Plus聚焦离子束纳米制造系统

高分辨率和多功能的聚焦离子束纳米加工、光刻和纳米工程


完美的电子束曝光和电子成像的双功能系统 PIONEER Two

结合了先进的纳米光刻和分析SEM成像技术的PIONEER Two


由于可提供多种解决方案,Raith设备在纳米结构不可或缺的器件和技术应用中发挥着作用。

无拼接错误蜂窝结构的平版印刷应用图片

选项(traxx和periodixx)功能用于实现无拼接误差的纳米光刻。

Raith纳米光刻系统和应用链接到产品概述

优异的纳米加工
可获得多种纳米光刻解决方案

作为世界领先的纳米加工仪器制造商,Raith帮助客户在他们的工作领域取得巨大的成果。凭着超过35年的经验和国际化的服务和支持体系,Raith对于纳米加工、电子束光刻、聚焦离子束纳米加工、纳米工程, 芯片逆向工程和生命科学中应用,提供着极佳的解决方案。在您所在领域的顶极位置,将以极佳的Raith解决方案来实现您的应用。

 联系我们以更多地了解Raith公司,您会相信,我们是您在纳米加工世界优秀的合作伙伴。

了解更多Raith公司信息

解决方案

不仅仅是电子束光刻

Raith可为市场提供多种纳米加工解决方案。公司独特的产品组合和服务包括升级现有的显微镜系统,各种类型的成套电子束光刻系统,以及聚焦离子束纳米加工和逆向工程。

无论您面对何种纳米加工的挑战,我们的产品都提供了理想的解决方案。

了解更多关于我们的纳米光刻,纳米制造和逆向工程的解决方案。

应用实例

Raith系统可用于各种各样的应用和领域中;从纳米物理和纳米医学,光电子学和材料科学的基础研究一直到量子技术,应用的可能性是无止境的。这里有几个例子来让您了解我们的客户是如何运用Raith系统及技术来实现工作目标。

查看纳米技术应用的一些例子——获得启发!

新闻中心

Raith European Nano Seminar in the UK - Sign up now

Get together with other nanofabrication experts and learn how a Raith solution may help solve your nanofabrication task.

We adapted our annual Nano Seminar and are offering the Raith European Nano Seminar in the UK for the first time!

There will be an interesting program with several invited speakers, so you can get the best out of the two-day seminar taking place from April 17th - 18th. Find out all the details and sign up here

EBL Training Course coming up - Sign up now!

Do you want to learn the basics of Electron Beam Lithography? Has your trained staff left and you are looking for a seamless and cost effective transition?

Then our LTC - Electron Beam Lithography Training Course is exactly the right choice for you. In several sessions the participants complete an offline software training and practical exposure training at EBL systems. The next course start on February 27th. Sign up now

Gips-Schüle Research Award for Ultracompact Photodetector

Congratulation to our customers at Karlsruhe Institute of Technology (KIT) who received the Gips-Schüle Research Award for the World’s Smallest Photodetector!

Sascha Mühlbrandt, Christian Koos, and Manfred Kohl of KIT’s Institute of Microtechnology/Institute of Photonics and Quantum Electronics were honored for their work on plasmonic photodetectors which combine an ultra-compact footprint with electro-optical bandwidths of hundreds of GHz.

More detailed information can be found in the paper "Silicon-plasmonic internal-photoemission detector for 40  Gbit/s data reception" which was published in Optica: https://doi.org/10.1364/OPTICA.3.000741

With the EBPG5200 at IMT the record-breaking ultracompact devices can be fabricated within a week. Nowadays their architecture can even be expanded from three to four layers which is only possible due to the high overlay accuracy of the patterning system. We are excited for our customers and eager to see where the research will lead in the future.

Press Releas KIT

Winner announcement Raith Micrograph Award 2017

Congratulations to this year's winner of the Raith Micrograph Award: Paul H. Kim, Sasa Gazibegovic and Maurangelo Petruzella. Find out who won an art award and take a closer look at the winner micrographs here

VOAYAGER installation in one minute

Time lapse video

The University of Bristol now has a Raith VOYAGER and you can watch it being installed in one minute!

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请在我们的下载专区阅读令人兴奋给人留下深刻印象的研究结果或技术细节。您可以选择浏览应用说明、产品手册、新闻快讯等等,使您能更深入地了解纳米加工世界。浏览我们的下载部分,或者下载PDF文件。

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